Advanced Industries’ eVerest RF power generator offers multilevel power pulsing and high-speed response for sub-2 nm semiconductor nodes. Integrated into any existing plasma power delivery system, ...
Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes. New impedance ...
As chip designs push the limits of speed, size and complexity, the semiconductor industry has set its sights on angstrom-scale device features. High-speed, precise and repeatable plasma power delivery ...
Plasma wakefield acceleration revolutionized the field of particle accelerators by generating gigavolt-per-centimeter fields. To compete with conventional radio-frequency (RF) accelerators, plasma ...
A developed high-performance 3−1/8″ coaxial two-way RF switch tailored for RF plasma discharge experiments including pre-ionization and start-up; wall conditioning and Ion Cyclotron Resonance Heating ...
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