The micro/nano metal pattern formation is a key step in the assembly of various devices. However, ex situ approaches of metal patterning limited their industrial applications due to the poor stability ...
As chipmakers move to advanced technology nodes, they are challenged to resolve ever finer features. One of the major roadblocks involves the material used to transfer chip design to the wafer. That ...
Sunfort™ dry film photoresist is a mainstay of Asahi Kasei’s Electronics business, comprising electronic materials and components. The entity is positioned as a First Priority business to drive growth ...
Most discussions of advanced lithography focus on three elements — the exposure system, photomasks, and photoresists — but that’s only part of the challenge. Successfully transferring a pattern from ...
A new process of in situ Ag fine pattern formation by direct pattern transfer of a modified tannic acid photoresist and in situ electroless plating in an Ag ion solution was reported. News ...
Laser-induced graphene (LIG), introduced in 2014 by Rice chemist James Tour, involves burning away everything that isn't carbon from polymers or other materials, leaving the carbon atoms to ...
SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...
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